发明名称 |
SEMICONDUCTOR DEVICE AND ITS FORMING METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a technique for reducing an optical leakage current in order to perform superior display. <P>SOLUTION: Microcrystals of polysilicon or the like containing a large number of carrier traps are distributed in a silicon film 102 which can obtain high- field effect mobility such as a continuous grain boundary crystal. Discontinuous crystal grain boundaries and in-grain defects of the microcrystal are made to function as trap sites for optical pumping charges, thereby providing a technique for obtaining a TFT in which high carrier mobility and a low optical leakage current are made compatible with each other. Since the TFT itself can reduce optical sensitivity (optical leakage current), a simpler light-shielding structure can be adopted, and manufacturing cost reduction is also enabled. <P>COPYRIGHT: (C)2004,JPO</p> |
申请公布号 |
JP2003297749(A) |
申请公布日期 |
2003.10.17 |
申请号 |
JP20020103543 |
申请日期 |
2002.04.05 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD;SHARP CORP |
发明人 |
SHIBATA HIROSHI;NAKA SHUNICHI;UEDA TORU |
分类号 |
G02F1/1368;H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/20 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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