发明名称 |
MASK FOR MANUFACTURING BUMP AND METHOD FOR MANUFACTURING BUMP OF SEMICONDUCTOR DEVICE USING THE SAME |
摘要 |
PURPOSE: A mask for manufacturing a bump and a method for manufacturing the bump of a semiconductor device using the same are provided to be capable of simplifying bump manufacturing processes and reducing fabrication cost. CONSTITUTION: After forming a metal pad(11) on a semiconductor substrate(10), a passivation layer(12) is formed at the upper portion of the resultant structure for partially exposing the metal pad. A barrier metal(13) is formed at the resultant structure by carrying out Au deposition. A bump mask(20) is formed at the upper portion of the resultant structure, wherein the bump mask includes a plurality of via holes corresponding to each metal pad. A bump(14) is formed in each via hole by carrying out Au electroplating. |
申请公布号 |
KR20030080553(A) |
申请公布日期 |
2003.10.17 |
申请号 |
KR20020019241 |
申请日期 |
2002.04.09 |
申请人 |
ANAM SEMICONDUCTOR., LTD. |
发明人 |
BAEK, SEUNG YEOK |
分类号 |
H01L21/60;(IPC1-7):H01L21/60 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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