发明名称 MASK FOR MANUFACTURING BUMP AND METHOD FOR MANUFACTURING BUMP OF SEMICONDUCTOR DEVICE USING THE SAME
摘要 PURPOSE: A mask for manufacturing a bump and a method for manufacturing the bump of a semiconductor device using the same are provided to be capable of simplifying bump manufacturing processes and reducing fabrication cost. CONSTITUTION: After forming a metal pad(11) on a semiconductor substrate(10), a passivation layer(12) is formed at the upper portion of the resultant structure for partially exposing the metal pad. A barrier metal(13) is formed at the resultant structure by carrying out Au deposition. A bump mask(20) is formed at the upper portion of the resultant structure, wherein the bump mask includes a plurality of via holes corresponding to each metal pad. A bump(14) is formed in each via hole by carrying out Au electroplating.
申请公布号 KR20030080553(A) 申请公布日期 2003.10.17
申请号 KR20020019241 申请日期 2002.04.09
申请人 ANAM SEMICONDUCTOR., LTD. 发明人 BAEK, SEUNG YEOK
分类号 H01L21/60;(IPC1-7):H01L21/60 主分类号 H01L21/60
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