| 摘要 |
PROBLEM TO BE SOLVED: To provide a ceramic heater with little fluctuation in heating temperature on a ceramic board and capable of evenly heating a silicon wafer as a heated object. SOLUTION: With the ceramic heater with a heating element formed on the surface of or inside the ceramic board, an even heating plate with a surface roughness Ra based on JIS B 0601 on a main face of a heating face side of 0.1 to 300μm is buried between the heating face of the ceramic board and the heating element. COPYRIGHT: (C)2004,JPO |
