发明名称 |
Polymers, resist compositions and patterning process |
摘要 |
A resist composition comprising a fluorinated polymer having carboxylate pendants and with a weight average molecular weight of 1,000-500,000 as a base resin is sensitive to high-energy radiation below 200 nm, has high transparency, resolution and plasma etching resistance, and is suited for lithographic microprocessing.
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申请公布号 |
US2003194645(A1) |
申请公布日期 |
2003.10.16 |
申请号 |
US20030406278 |
申请日期 |
2003.04.04 |
申请人 |
HARADA YUJI;HATAKEYAMA JUN;KAWAI YOSHIO |
发明人 |
HARADA YUJI;HATAKEYAMA JUN;KAWAI YOSHIO |
分类号 |
C08F236/20;G03F7/004;G03F7/039;(IPC1-7):G03F7/039;G03F7/38;G03F7/40 |
主分类号 |
C08F236/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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