| 摘要 |
<p>An EL device manufacturing method in which it is possible to avoid unnecessary layers formed by photolithography on each light emission part formed on a pattern and to separate the unnecessary layers easily and quickly. The EL device manufacturing method is characterized by comprising a step of forming a different color light emission layer to represent a color different from that of the light emission part on a substrate provided with a light emission part of at least one color having a photoresist layer on its surface, a patterning step carried out to leave the photoresist layer for the different color light emission layer of a part where the different color light emission part is formed by forming the photoresist layer for the different color light emission, and performing the pattern exposure and development, and a step of forming a pattern-like different color limit emission part having the photoresist layer for the different color light emission layer on its surface thereof by removing the different color light emission layer.</p> |
