EXTREME ULTRAVIOLET LIGHT SOURCE

摘要

An extreme ultraviolet light source for producing extreme ultra violet light of high output power by increasing the working distance. The extreme ultraviolet light source produces extreme ultraviolet (EUV) light having a wavelength of several nanometers to several tens of nanometers by irradiating a target (22) with a laser beam from a driving laser apparatus (25) and producing a plasma. The extreme ultraviolet light source comprises a target supply device having charging means (23) for charging the target (22) and accelerating means (24) for accelerating the charged target by means of an electromagnetic field. The target supply device supplies, as an ionized molecule, an ionized atom, a mass of atoms, or an ionized cluster, the target (22) made of a rare gas element such as xenon (Xe), or a metal, e, g., lithium (Li), tin (Sn), or tin oxide (SnO2).