REFERENCE ELECTRODE CALIBRATION FOR VOLTAMMETRIC PLATING BATH ANALYSIS
摘要
In the present invention, the test reference electrode used for voltammetric analysis of a plating bath is calibrated relative to the zero-current point between metal plating and stripping at a rotating platinum disk electrode in the plating bath supporting electrolyte. This calibration is readily performed during the normal course of cyclic voltammetric stripping (CVS) or cyclic pulse voltammetric stripping (CPVS) plating bath analysis the need for additional instrumentation or removal of the test reference electrode from the analysis equipment. Automatic calibration of the reference electrode enabled by the present invention, saves labor, time and expense, and minimizes errors in the plating bath analysis.
申请公布号
WO03085173(A2)
申请公布日期
2003.10.16
申请号
WO2003US07889
申请日期
2003.03.13
申请人
CHALYT, GENE;BRATIN, PETER;PAVLOV, MICHAEL;KOGAN, ALEX;PERPICH, MICHAEL, JAMES
发明人
CHALYT, GENE;BRATIN, PETER;PAVLOV, MICHAEL;KOGAN, ALEX;PERPICH, MICHAEL, JAMES