发明名称 |
Photoresist compositions comprising acetals and ketals as solvents |
摘要 |
Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.
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申请公布号 |
US2003194636(A1) |
申请公布日期 |
2003.10.16 |
申请号 |
US20020120952 |
申请日期 |
2002.04.11 |
申请人 |
WANAT STANLEY F.;OBERLANDER JOSEPH E.;PLASS ROBERT R.;MCKENZIE DOUGLAS |
发明人 |
WANAT STANLEY F.;OBERLANDER JOSEPH E.;PLASS ROBERT R.;MCKENZIE DOUGLAS |
分类号 |
G03F7/004;G03F7/022;G03F7/023;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03F7/023;G03F7/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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