| 发明名称 |
Resist compositions and patterning process |
| 摘要 |
A resist composition comprising a blend of a polymer comprising recurring units k and m of formula (1) wherein R<superscript>1 >and R<superscript>2 >each are hydrogen or an acid labile group, 0<k<1, 0<m<1 and 0<k+m<=1, and another polymer comprising recurring units having carboxyl groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.
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| 申请公布号 |
US2003194644(A1) |
申请公布日期 |
2003.10.16 |
| 申请号 |
US20030406222 |
申请日期 |
2003.04.04 |
| 申请人 |
HATAKEYAMA JUN;HARADA YUJI;KAWAI YOSHIO |
发明人 |
HATAKEYAMA JUN;HARADA YUJI;KAWAI YOSHIO |
| 分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/039;G03F7/38;G03F7/40 |
主分类号 |
G03F7/004 |
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