发明名称 |
UNIFORM BROAD ION BEAM DEPOSITION |
摘要 |
Apparatus for the generation of a plurality of ion beams for use in vacuum sputtering methods is disclosed comprising: a discharge chamber, defined by a plasma confinement vessel, for generation of a plasma therein; and a plurality of facets located on the discharge chamber, each facet comprising acceleration and extraction means for extracting ions from the plasma in the discharge chamber in an ion beam. |
申请公布号 |
WO02097850(A3) |
申请公布日期 |
2003.10.16 |
申请号 |
WO2002GB02544 |
申请日期 |
2002.05.29 |
申请人 |
NORDIKO LIMITED;DAVIS, MERVYN, HOWARD;PROUDFOOT, GARY |
发明人 |
DAVIS, MERVYN, HOWARD;PROUDFOOT, GARY |
分类号 |
C23C14/46;H01J27/02;H01J27/18;H01J37/08;H01J37/305 |
主分类号 |
C23C14/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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