| 摘要 |
<p>A field effect transistor device and a method for making a field effect transistor device are disclosed. The field effect transistor device includes a stripe trench extending from the major surface of a semiconductor substrate (29) into the semiconductor substrate (29) to a predetermined depth. The stripe trench (35) contains a semiconductor material of the second conductivity type to form a PN junction at an interface formed with the semiconductor substrate (29).</p> |
