发明名称 DEVICE AND METHOD FOR FORMING THIN-FILM, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENT USING THE DEVICE
摘要 <p>A thin-film forming device, wherein vacuum tanks having a plurality of film forming chambers are installed on different planes and allowed to communicate with each other through vacuumed exchange chambers, and a substrate is exchanged between the vacuum chambers by a substrate exchange mechanisms installed in the exchange chambers, whereby the number of chambers in the thin-film forming device can be easily increased, an area for installation can be reduced, and a production efficiency can be increased.</p>
申请公布号 WO2003085160(P1) 申请公布日期 2003.10.16
申请号 JP2003004171 申请日期 2003.04.01
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