| 摘要 |
<p>A spattering device, wherein an inner mask covering a substrate center part is supported by a bearing installed on a backing plate at the rear of a target and allowed to abut on the substrate with a specified load by a spring, whereby when thin film is stacked, the inner mask in contact with the substrate can also be rotated together with the substrate to surely form a non-film forming area at the center part of the substrate, and a film thickness in the film forming area can be improved.</p> |
