| 摘要 |
PROBLEM TO BE SOLVED: To obtain a measuring apparatus which uses evanescent waves for detecting a position of a dark line in a light beam by a plurality of light receiving elements, which reduces a measurement error caused by a sensitivity characteristic of each light receiving element, and whose measurement accuracy is enhanced. SOLUTION: The measuring apparatus is provided with a dielectric block 10, a laser light source 14 used to generate the light beam 13, an optical system 15 by which the light beam 13 is made incident so as to obtain various incident angles with respect to an interface 10b between the dielectric block 10 and a metal film 12, and a light detection means 17 used to detect the light beam 13 totally reflected by the interface 10b so as to be changed to parallel light. An intensity of the light beam 13 totally reflected by the interface 10b is measured in a plurality of numbers of times in a time series, and a plurality of measured data obtained by its measurement are smoothed (averaged) by a signal processor 20 (a smoothing means). COPYRIGHT: (C)2004,JPO
|
