发明名称 NEW PHOTOPOLYMERIZABLE MONOMER AND RADIATION-SENSITIVE CURING COMPOSITION CONTAINING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To find a new photopolymerizable monomer rapidly polymerized in a high sensitivity responsive to a radiation and to find a radiation-sensitive curing composition by utilizing the monomer. <P>SOLUTION: The monofunctional photopolymerizable monomer has a polymerizable unsaturated bond and 1,3,4-thiadiazole in the molecule. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003292535(A) 申请公布日期 2003.10.15
申请号 JP20020095570 申请日期 2002.03.29
申请人 MITSUBISHI PAPER MILLS LTD 发明人 FURUKAWA AKIRA
分类号 G03F7/027;C07D285/12;C07D285/125;C07D285/135;C08F12/30;C08F290/08;G03F7/033 主分类号 G03F7/027
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