发明名称 METHOD FOR MANUFACTURING PATTERN FORMING BODY AND PHOTOMASK USED FOR THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a pattern forming body which can form patterns with high accuracy in manufacturing the pattern forming body, does not require a post treatment after exposure and eliminates the worry about the deterioration of the pattern forming body itself as a photocatalyst is not contained in the formed pattern forming body itself. <P>SOLUTION: The method for manufacturing the pattern forming body has a substrate preparing process step for the pattern forming body of preparing a substrate for the pattern forming body having a characteristic changing layer changed in the characteristics of the surface by the effect of the photocatalyst and a pattern forming process step of forming the patterns changed in the characteristics on the surface of the characteristic changing layer by arranging the photocatalyst-containing layer side substrate formed with the photocatalyst- containing layer containing the photocatalyst on the substrate and the characteristic changing layer apart a spacing so as to attain &le;200 &mu;m, then irradiating the layers with energy from a prescribed direction by which forming the pattern changed in the characteristics on the surface of the layers. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003295428(A) 申请公布日期 2003.10.15
申请号 JP20020086168 申请日期 2002.03.26
申请人 DAINIPPON PRINTING CO LTD 发明人 KOBAYASHI HIRONORI
分类号 G03F7/004;B01J35/02;G02B5/20;G03F1/68;G03F1/70;G03F7/075 主分类号 G03F7/004
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