| 摘要 |
PURPOSE:To form a multiple beam type charged-beam exposure apparatus, in which the bit number in a control circuit is made extremely small, by providing a distortion correcting electrode, and directly correcting the beam position without allocating time for distortion correcting computation. CONSTITUTION:An electron beam, which is discharged from an electron gun 1, is reduced by an electron-beam limiting aperture 2 and a reducing lens 3. Thereafter, the position of the electron beam is corrected by a distortion correcting electrode 16. Then the beam reaches the surface of a sample. The distortion correcting electrode 16 is provided at every exposure device of a multiple beam exposure apparatus. Therefore, application of distortion correction to a control circuit for a field-scanning deflection electrode 5 becomes unnecessary. Only the control by a drawing position signal sufficient enough. Thus, the output signal of a drawing-position control circuit can be connected to the multiple-beam exposure apparatus in parallel. A distortion-correction control circuit is required for each exposure device. The number of digits of the distortion correcting value is few as compared with the drawing position data, and the apparatus can be constituted at a low cost. Since the number of the digits is few, high speed processing can be carried out.
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