| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering system which improves productivity by improving the use efficiency of a target. SOLUTION: This sputtering system includes: a target 20 which is opposed to and spaced from a substrate holder 10a, has a rectangular and flat plate form, and has an elliptic arc-shaped projecting part 20aa added to both ends in a rectangular longitudinal direction; a magnet unit structure 32 opposed to and spaced from the rear side; a mounting member 34 and a plurality of magnet units 36 attached to the member 34; and a movement mechanism 38 to move the mounting member 34 reciprocately. Each end of the mounting member 34 includes: an elliptic arc-shaped yoke 36c set to be correspondent to an erosion region for the target 20; outer circumference magnets 36b formed along the outer circumference of the yoke 36c; and the magnet units 36 including central magnets 36a having a reverse polarity to the outer circumference magnets provided in the vicinity of the central part of the yoke 36c. COPYRIGHT: (C)2004,JPO
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