发明名称 |
Cleaning of a pellicle-mask assembly |
摘要 |
A main objective of the present invention is to provide a method of making a foreign matter harmless which can make the foreign matter, after attaching a pellicle, existing on a transmitting region of a reticle with a pellicle harmless, under pellicle attached condition. For attaining the above-described objective, the present invention provides a method of making a foreign matter harmless wherein a foreign matter existing on a transmitting region of a reticle with a pellicle is irradiated with laser, via the pellicle membrane to make the foreign matter harmless. <IMAGE> |
申请公布号 |
EP1353224(A1) |
申请公布日期 |
2003.10.15 |
申请号 |
EP20030252304 |
申请日期 |
2003.04.11 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
KOIZUMI, YASUHIRO;TSUCHIYA, KATSUHIDE |
分类号 |
G03F1/62;G03F1/72;G03F7/20;H01L21/027;(IPC1-7):G03F1/14;G03F1/00 |
主分类号 |
G03F1/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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