发明名称 Cleaning of a pellicle-mask assembly
摘要 A main objective of the present invention is to provide a method of making a foreign matter harmless which can make the foreign matter, after attaching a pellicle, existing on a transmitting region of a reticle with a pellicle harmless, under pellicle attached condition. For attaining the above-described objective, the present invention provides a method of making a foreign matter harmless wherein a foreign matter existing on a transmitting region of a reticle with a pellicle is irradiated with laser, via the pellicle membrane to make the foreign matter harmless. <IMAGE>
申请公布号 EP1353224(A1) 申请公布日期 2003.10.15
申请号 EP20030252304 申请日期 2003.04.11
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 KOIZUMI, YASUHIRO;TSUCHIYA, KATSUHIDE
分类号 G03F1/62;G03F1/72;G03F7/20;H01L21/027;(IPC1-7):G03F1/14;G03F1/00 主分类号 G03F1/62
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