| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having satisfactory transmittance when a light source of ≤160 nm, concretely F<SB>2</SB>excimer laser light (157 nm) is used, excellent in sensitivity and contrast and ensuring a small number of particles in a resist solution. <P>SOLUTION: A positive resist composition is provided which contains an acid-decomposable resin containing at least one each of repeating units represented by formulae (I) and (II) and further containing at least one of the repeating units represented by formulae (IIIa)-(IIIc), and a positive resist composition is provided which contains an alkali-soluble resin containing at least one each of repeating units represented by the formulae (I) and (II) and further containing at least one of the repeating units represented by formulae (III'a)-(III' c). <P>COPYRIGHT: (C)2004,JPO |
