发明名称 SCREEN MASK AND METHOD FOR CLEANING THE SAME SCREEN MASK
摘要 PROBLEM TO BE SOLVED: To enable a screen mask used to print a cream solder to be cleaned until the mask can endure continuous printing and to be realized at low cost. SOLUTION: The screen mask 1 includes a printing region made of a pore group for a printing pattern, and comprises: cleaning liquid passing holes 2 provided out of the printing region to pass the cleaning liquid used to clean the mask after printing. The mask 1 further comprises: a wet type cleaning unit 41 disposed under the mask to supply and clean the lower surface of the mask, and a dry cleaning unit 42 disposed above the mask and having a cleaner for wiping the upper surface of the mask. In this mask, the mask is cleaned to be wiped by both the units. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003291554(A) 申请公布日期 2003.10.15
申请号 JP20020096567 申请日期 2002.03.29
申请人 SONY CORP 发明人 MITSUMOTO HISAYUKI
分类号 B41F35/00;B08B1/00;B08B3/12;B08B7/04;B41N1/24;H05K3/26;H05K3/34;(IPC1-7):B41N1/24 主分类号 B41F35/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利