| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative photosensitive composition which can form a resist film having excellent dry etching durability and hardly producing cracks when a pattern is formed. <P>SOLUTION: The negative photosensitive composition comprises: (A) a polyorganosiloxane resin containing an oxiranyl group or an oxetanyl group; (B) an alkali-soluble polyorganosiloxane resin containing an oxiranyl group or an oxetanyl group and containing a carboxyalkyl group or a hydroxyphenyl group; (C) a polyorganosiloxane resin having a hydroxyl group; and (D) a compound which generates acid by electromagnetic rays or heat. <P>COPYRIGHT: (C)2004,JPO |
