| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for easily measuring film thickness of a miniaturized repetitive thin film pattern by using X-ray fluorescence measurement. SOLUTION: This method is for using X-ray fluorescence to measure film thickness of a pattern structure section. However, an excitation X-ray 1 used as a probe should be of its beam diameter larger than the pattern dimension of the measuring object so that its irradiation range includes a number of repetitive patterns. Also, the plane directional dimension of the pattern should be used when converting the detected X-ray dosage into the film thickness. COPYRIGHT: (C)2004,JPO
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