发明名称 |
Ion gun deposition and alignment for liquid-crystal applications |
摘要 |
The present invention includes a method of forming an aligned film on a substrate. The film is deposited and aligned in a single step by a method comprising the step of bombarding a substrate with an ion beam at a designated incident angle to simultaneously (a) deposit the film onto the substrate and (b) arrange an atomic structure of the film in at least one predetermined aligned direction.</PTEXT>
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申请公布号 |
US6632483(B1) |
申请公布日期 |
2003.10.14 |
申请号 |
US20000608798 |
申请日期 |
2000.06.30 |
申请人 |
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发明人 |
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分类号 |
C23C14/06;C23C14/22;C23C14/34;G02F1/1337;(IPC1-7):C23C14/48;C23C14/24;C23C16/26;B05D5/00 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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