| 发明名称 |
Positive resist composition |
| 摘要 |
A positive resist composition which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B) a resin which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and contains repeating units represented by formulae (I) and (V):
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| 申请公布号 |
US6632586(B1) |
申请公布日期 |
2003.10.14 |
| 申请号 |
US19990392588 |
申请日期 |
1999.09.09 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
AOAI TOSHIAKI;SATO KENICHIRO |
| 分类号 |
H01L21/027;C08F8/14;C08F20/10;C08L101/02;C09D201/02;G03F7/004;G03F7/039;(IPC1-7):G03C1/72;G03C1/73 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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