发明名称 DRY PLATE FOR EXPOSURE
摘要 PURPOSE:To improve resolution of transferred pattern by an exposure with reflected light by providing a filter film, which reduces wholly or partly reflectance of a transparent base plate, onto a surface of a metallic film for forming a pattern formed on a surface of the transparent base plate. CONSTITUTION:Irradiating light from a light source 24 is made incident onto a dry plate for exposure through a half mirror 25, and reflected light is made incident onto a base plate 26 for exposure after being reflected by the half mirror 25. Thus, a photosensitive material 27 is sensitized and a pattern is transferred. When a filter film 23 for reducing a reflectance is provided onto a Cr film 22 for forming the pattern on the surface of the dry plate for exposure, the reflected light at this part is made less intense than the reflected light from a glass base plate 21. Thus, a contrast between the reflected light from the base plate 21 and the reflected light from the film 23 is enhanced. Further, the shape of a pattern transferred to the base plate 26 becomes equal to the shape on the film 23. Thus, a resolution of a pattern transferred onto the base plate is improved.
申请公布号 JPH01232347(A) 申请公布日期 1989.09.18
申请号 JP19880059602 申请日期 1988.03.14
申请人 FUJITSU LTD 发明人 AKUTAGAWA SATORU
分类号 G03F1/00;H01L21/027;H01L21/30 主分类号 G03F1/00
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