| 摘要 |
A large-sized substrate (1) having a diagonal length of not less than 500mm and a ratio of flatness/diagonal length of not more than 6.0x10<-6> is disclosed. By use of the large-sized substrate (1) for exposure of the present invention, the exposure accuracy, particularly the register accuracy and resolution are enhanced, so that it is possible to achieve high-precision exposure of a large-sized panel. With the processing method according to the present invention, it is possible to stably obtain a large-sized photomask substrate with a high flatness, and since the dimensional accuracy at the time of exposure of the panel is enhanced, it is possible to perform exposure of a fine pattern, leading to a higher yield of the panel. Furthermore, by applying the processing method according to the present invention, it is also possible to create an arbitrary surface shape. <IMAGE> <IMAGE> |
