| 摘要 |
PURPOSE: To effectively preserve the surface of a silicon wafer by treating a hydrophobic wafer surface with a reagent selected from aliphatic alcohols, organosilanes and in particular, silanols, to form a protective layer on the surface. CONSTITUTION: This method comprises treating a hydrophobic wafer surface with a reagent selected from aliphatic alcohols, organosilanes and in particular, silanols, to form a protective layer on the surface and to preserve the silicon wafer surface. More specifically, the treatment of a silicon wafer surface converted into a hydrophobic state by polishing, or the like, can appropriately be performed by, after completing the polishing process, retaining the wafer in the polishing device used and immediately after stopping supply of the polishing material used, rinsing the wafer surface with an aq. solution contg. the above selected reagent. |
