| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflective electrooptic device in which variation in irregular shape is avoided by maintaining uniform conditions at the lower layer side of an irregularity-forming layer when being formed by using a photolithographic technique, and to provide an electronic apparatus. <P>SOLUTION: In a TFT array substrate (10) of the reflective electrooptic device, an irregularity-forming layer (13a) for forming an irregular pattern (8g) on a light reflection film (8a) is formed by, half exposure, development, and heating performed for a photosensitive resin (13). At the lower layer side of the irregularity-forming layer (13a), since a height difference, i.e., a step is eliminated by a step-eliminating film (3f), exposure can be preferably performed for the photosensitive resin (13). In addition, since the height difference is eliminated, variation in thickness of the photosensitive resin (13) is small, and hence variation in irregular shape becomes small. <P>COPYRIGHT: (C)2004,JPO |
