| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an organic metal precursor for easily forming an electroconductive metal pattern by exposure to light. <P>SOLUTION: The organic metal precursors for forming the metal pattern are represented by the formula: M<SB>m</SB>L<SB>n</SB>L'<SB>o</SB>X<SB>p</SB>, wherein M is a transition metal atom selected from the group consisting of Ag, Au, Co, Cu, Pd, Ni, Pt, Zn, and Cd: L and L' are organic ligands each having a particular structure; X is an anionic ligand; each of m and n, independently, is an integer of 1-10; and each of o and p, independently, is an integer of 0-10. The organic ligands constituting the organic metal precursor are so photosensitive that it is rapidly dissociated and degraded from the central metal atoms upon exposure to light. Therefore, the use of the precursor makes the extra steps of photosensitive resin application and etching for forming the metal pattern avoidable, and thus shortens the patterning time. <P>COPYRIGHT: (C)2004,JPO |
