| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a metal polishing composition of which the etching performance is controlled low and which suppresses a defect on a polished surface such as scratch and erosion. <P>SOLUTION: In the manufacturing method of the metal polishing composition, where a poly oxo acid and/or salt (A) and a nonionic surface-active agent (B) are indispensable components, (A) and (B) are stirred while heating when (A) and (B) are mixed. <P>COPYRIGHT: (C)2004,JPO</p> |
