METHOD FOR MONITORING PROCESS DATA OF EACH CHAMBER IN MULTI-CHAMBER EQUIPMENT

摘要

PURPOSE: A method for monitoring process data of each chamber in a multi-chamber equipment is provided to be capable of running the whole multi-chamber equipment except only the process failure generated chamber for improving the productivity and yield of semiconductor wafers, though process failure is generated. CONSTITUTION: The first chamber information of each slot is stored in database when carrying out a main step. After completing a predetermined process in the main step, the second chamber information formed while carrying out the main step in a chamber equipment(10) is compared to the first chamber information of each slot stored in the database by using the slot number of one wafer as a reference, wherein the wafer is completed with a sampling process of a measure step. Then, the exact chamber related with the measured wafer is checked out of the chamber equipment(10).