| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate treatment device equipped with a detection sensor, which is capable of detecting both cutouts such as notches or the like in a substrate such as an Si wafer or the like possessing high reflectivity and other cutouts such as notches or the like in another substrate such as a transparent glass wafer or the like possessing low resistivity. <P>SOLUTION: The substrate treatment device is equipped with the detection sensor 2 which detects cutouts (notches 31) in the substrate (wafer 30). The device is provided with a light projector-photosensor 10 with a light source and a reflection-type detection unit and a photosensor 20 with a transmission- type detector. <P>COPYRIGHT: (C)2004,JPO</p> |
