发明名称 HIGH SELECTIVITY SILVER ETCHANT
摘要 PURPOSE: A high selectivity silver(Ag) etchant is provided, which is environmentally friendly, has proper etching ratio and side etching amount and particularly has not any IZO attack by containing a large amount of water and 0.5 to 10 wt.% of Fe¬3+ salt compound as oxidizer. CONSTITUTION: The silver(Ag) etchant comprises 0.5 to 10 wt.% of Fe¬3+ salt compound; 0.1 to 12 wt.% of HNO3; 3 to 15 wt.% of CH3CO2H; 0.01 to 3.0 wt.% of corrosion inhibitor; and a balance of water, wherein the Fe¬3+ salt compound is selected from the group consisting of FeCl3, Fe(NO3)3, NH4Fe(SO4)2 and Fe2(SO4)3, and wherein the corrosion inhibitor is a compound selected from the group consisting of m-toluylenediamine, ethylenediaminetetraacetate(EDTA), hexamethylenetetraamine(HMTA), triethylenetetraamine(TETA), octylamine, tetra methylene tetramine(TMTA), benzotriazole(BTA), 5-aminotetrazole(5-ATZ) and triazole.
申请公布号 KR20030079323(A) 申请公布日期 2003.10.10
申请号 KR20020018283 申请日期 2002.04.03
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 SONG, HYEONG SU;KIM, GI SEOP;PARK, MIN CHUN;KIM, SEONG SU;LEE, JAE YEON
分类号 C23F1/30;(IPC1-7):C23F1/30 主分类号 C23F1/30
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