发明名称 SUBSTRATE TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of early detecting a coating failure to a substrate. <P>SOLUTION: A coating unit 14 of a substrate treatment device is provided with a stage 3 having a holding face 30 on which a rectangular substrate 90 is almost horizontally mounted, a crosslinked structure 4 almost horizontally crosslinked above the holding face 30, and an image pickup part 23 for imaging the surface of the substrate 90. The crosslinked structure 4 is provided with a nozzle supporting part 40 on which a slit nozzle for discharging a resist is mounted. The surface of the substrate 90 is scanned by the slit nozzle while the resist is applied. When the application of resist is finished, the surface of the substrate 90 is imaged by the image pickup part 23, and image data are transferred to a deciding part 24. Image recognition is performed to the image data by the deciding part 24, and the coating condition of the substrate 90, that is, whether or not a coating failure such as fading is generated on the substrate 90 is decided. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003289030(A) 申请公布日期 2003.10.10
申请号 JP20020090347 申请日期 2002.03.28
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 FUKUCHI TAKESHI;KISE KAZUO
分类号 G03F7/16;B05C5/02;B05C11/00;H01L21/027 主分类号 G03F7/16
代理机构 代理人
主权项
地址