SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment device and a substrate treatment method capable of reducing the consumption of a treatment solution. SOLUTION: Rinse solution feeding nozzles 41a to 41g are disposed in parallel while being separated of almost equal intervals along a treatment solution feeding direction (scanning direction A) from one edge side SE to the other edge side EE of the substrate W at the time of supplying a rinse solution on the substrate W held by a substrate holding part. The rinse solution feeding nozzles 41a to 41g are respectively provided with discharge ports 43a to 43g each of whose discharge widths is almost equal to the width of the substrate W at each feeding position. Thus, it is possible to reduce the discharge of the rinse solution outside the substrate W at each feeding position, and to reduce the consumption of the rinse solution. COPYRIGHT: (C)2004,JPO