发明名称 APPARATUS AND METHOD FOR MONITORING CONCENTRATION OF OXIDIZING GAS OR OXIDIZING VAPOR
摘要 PROBLEM TO BE SOLVED: To obtain an apparatus and a method for monitoring a concentration of a oxidizing gas or oxidizing vapor by providing a real-time measured value of the concentration of the oxidizing gas (or the oxidizing vapor) inside a diffusion-restricted region. SOLUTION: In a concentration monitor 410, a diffusion-restricted region 40 in fluid communication with a sterilization chamber is arranged inside a region in which a variable is generated in response to the oxidizing gas or the oxidizing vapor and in at least a part of which a diffusion is restricted. The concentration monitor comprises a first temperature sensing device 412 and a chemical substance 414 reacting with the oxidizing gas or the oxidizing vapor. The first temperature sensing device is coupled to the chemical substance so as to generate a first signal in response to heat generated by the chemical substance and the oxidizing gas or the oxidizing vapor, and the variable is generated in response to the first signal. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003287512(A) 申请公布日期 2003.10.10
申请号 JP20020320245 申请日期 2002.11.01
申请人 ETHICON INC 发明人 HUI HENRY K;LIN SZU-MIN;TIMM DEBRA;LEMUS ANTHONY;FRYER BEN;ENGSTROM KEITH
分类号 G01N25/22;A61L2/20;A61L2/24;A61L2/26;A61L2/28;G01N25/28;G01N25/32;G01N31/22;(IPC1-7):G01N25/22 主分类号 G01N25/22
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