发明名称 SURFACE TREATMENT SYSTEM AND METHOD
摘要 <p>A surface treatment system is disclosed to form a deposition layer at a surface of an object of surface treatment by using a deposition reaction in which an electrode (110) for applying power to form a deposition reaction in the deposition chamber (100) is installed between an inner wall (120) of the deposition chamber (100) and an object of surface treatment (900) and further includes a cooling unit (200) installed at the inner wall (120) of the deposition chamber (100) facing the electrode (110) and cooling ambient thereof.</p>
申请公布号 WO2003083165(P1) 申请公布日期 2003.10.09
申请号 KR2002002492 申请日期 2002.12.30
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