发明名称 |
Manufacture of masks and electronic parts |
摘要 |
Imageable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infrared absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.
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申请公布号 |
US2003190533(A1) |
申请公布日期 |
2003.10.09 |
申请号 |
US20030354838 |
申请日期 |
2003.01.30 |
申请人 |
KODAK POLYCHROME GRAPHICS, LLC |
发明人 |
RAY KEVIN BARRY;KITSON ANTHONY PAUL;KOTTMAIR EDUARD;GLATT HANS-HORST;HILGART STEFAN |
分类号 |
B41C1/10;G03F7/023;H05K3/00;(IPC1-7):G03F9/00 |
主分类号 |
B41C1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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