PH BUFFERED COMPOSITIONS FOR CLEANING SEMICONDUCTOR SUBSTRATES,申请号WO2003US08408-传众专利搜索

发明名称	PH BUFFERED COMPOSITIONS FOR CLEANING SEMICONDUCTOR SUBSTRATES
摘要	<p>A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation comprising a buffering system a polar organic solvent, and a fluoride source.</p>
申请公布号	WO03083582(A1)	申请公布日期	2003.10.09
申请号	WO2003US08408	申请日期	2003.03.18
申请人	ADVANCED TECHNOLOGY MATERIALS, INC.	发明人	SEIJO, MA, FATIMA;WOJTCZAK, WILLIAM, A.;BERNHARD, DAVID;BAUM, THOMAS, H.;MINSEK, DAVID
分类号	C11D7/10;C11D7/22;C11D7/26;C11D7/28;C11D7/32;C11D11/00;C23G1/02;G03F7/42;H01L21/02;H01L21/28;H01L21/304;H01L21/306;H01L21/308;H01L21/311;H01L21/316;H01L21/3213;H01L21/768;(IPC1-7):G03F7/42;C23G1/06;C23G1/14;C23G1/18;C23G5/00;C23G5/02;C23G5/036;C23G5/032	主分类号	C11D7/10
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