发明名称 APPARATUS AND METHOD FOR DEPOSITING ORGANIC MATTER OF VAPOR PHASE
摘要 The present invention relates to a vapor organic material deposition method and a vapor organic material deposition apparatus using the same which are capable of fast growing a thin film uniformly on a wider substrate by spraying a vapor organic material in a gravity direction using a spraying unit installed in an upper side of the same and accurately and stably adjusting a thickness of a wider substrate of an organic thin film by using a diluting gas as a deposition material and continuously carrying a small size heat source to a scan head.
申请公布号 WO03083169(A1) 申请公布日期 2003.10.09
申请号 WO2003KR00605 申请日期 2003.03.27
申请人 ANS INC;KIM, DONG-SOO;BAE, KYUNG-BIN;CHOI, DONG-KWON 发明人 KIM, DONG-SOO;BAE, KYUNG-BIN;CHOI, DONG-KWON
分类号 C23C14/12;C23C16/44;C23C16/448;C23C16/455 主分类号 C23C14/12
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