| 摘要 |
PURPOSE:To correct a phase shift mask by supplying gas from a gas system for forming a light shielding part and/or a phase shift part while irradiating a lacking part with an ion beam so that a necessary part may be formed and irradiating an unnecessary part with the ion beam so that it may be removed. CONSTITUTION:The surface of a mask is irradiated with the ion beam 22 by an ion beam irradiating means and a secondary ion 51 generated by the irradiation of the ion beam is monitored by a monitoring means 6 so as to detect whether or not the light shielding part and/or the phase shift part exists at a desired position. By supplying the gas from the gas system for forming the light shielding part 10 and/or the phase shift part 11 while the lacking part 41 of the light shielding part 10 and/or the phase shift part 11 is irradiated with the ion beam 22 by the ion beam irradiating means based on the detected result, the light shielding part 10 and/or the phase shift part 11 is formed. The unnecessary part of the light shielding part 10 and/or the phase shift part 11 is irradiated with the ion beam by the ion beam irradiating means so as to be removed. Thus, the phase shift mask is corrected. |
