| 发明名称 |
THINNER COMPOSITION FOR REMOVING PHOTOSENSITIVE RESIN |
| 摘要 |
The present invention relates to a thinner composition for removing photosensitive resin, which is used in manufacture processes of semiconductor devices and liquid crystal display devices. The present invention provides a thinner composition comprising propyleneglycol monoalkyl ether acetate, cycloketone, polyethylene based condensate and fluorinated acrylic copolymer. |
| 申请公布号 |
WO03083032(A1) |
申请公布日期 |
2003.10.09 |
| 申请号 |
WO2003KR00632 |
申请日期 |
2003.03.28 |
| 申请人 |
DONGJIN SEMICHEM CO., LTD.;PARK, SOON-HEE;LEE, SANG-DAI;JUN, WOO-SIK |
发明人 |
PARK, SOON-HEE;LEE, SANG-DAI;JUN, WOO-SIK |
| 分类号 |
G03F7/32;C09D9/00;C11D3/37;C11D3/43;C11D11/00;G03F7/16 |
主分类号 |
G03F7/32 |
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