发明名称 PATTERN DEFECT INSPECTING DEVICE
摘要 PURPOSE:To detect defects with simple processing at a high speed by positioning a filter and the diffracted light at the time of an inspection via the control of the reflected light direction only, controlling the incident light direction to control the reflection direction, and setting the inspection region to the portion with many repetitions only. CONSTITUTION:Inspection regions for individual visual fields are calculated in advance based on the design data of the pattern generated by a computer 15, and the inspection region corresponding to each visual field is set at the time of an inspection. An XY table 13 is provided on the mount bed of a tested sample, the partial visual field of the tested pattern is inspected in sequence, the correction in the rotation angle direction is performed in package at the time of the positioning of a filter 8 and the diffracted light, and only the reflected light direction is corrected during the inspection for each visual field. For the correction of the reflected light direction, a control device 14 adjusts the angle of the folded mirror 5 of a projecting system to correct the incident light direction, only the pattern section with many repetitions is inspected to remove the remaining pattern, and the portion with few repetition is removed by masking.
申请公布号 JPH04109152(A) 申请公布日期 1992.04.10
申请号 JP19900231973 申请日期 1990.08.29
申请人 MITSUBISHI ELECTRIC CORP 发明人 TANAKA HITOSHI;MIYAZAKI YOKO;KOSAKA NORIYUKI;TOMOTA TOSHIMASA;OSHIGE TOYOMI;KANDA TOMOYUKI;ICHIMURA HIDEO;YOSHIKAWA YUUKI
分类号 G01N21/88;G01N21/956;G03F1/84;G06T1/00 主分类号 G01N21/88
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