发明名称 X-RAY DIFFRACTION MICROSCOPIC APPARATUS
摘要 PURPOSE:To continuously observe the two-dimensional distribution of a change of a lattice constant over the entire surface of a wafer by spectrally diffracting diffracted X-rays obtained by irradiating a sample with X-rays made monochromatic while subjecting the sample to omega rotation by an analyzer whose angle is fixed. CONSTITUTION:When X-rays made monochromatic by a monochrometer 13 is incident to a collimator 16, the angle of diffusion of X-rays 17 emitted from the collimator 16 becomes small by asymmetric reflection using the lattice surface obliquely present with respect to the surface of a crystal and the flux thereof becomes wide. The X-rays 17 are allowed to be incident to the sample 18 arranged to a goniometer head susceptible to omega-2theta rotation and the diffracted rays 19 from a sample 18 are spectrally diffracted by the analyzer 111 arranged to the goniometer susceptible to omega-2theta rotation. As this time, when the analyzer 111 is subjected to omega rotation within the angle range of the locking curve of the sample 18 while the fixed angle thereof is changed little by little, only the diffracted rays 113 from the region having the lattice constant corresponding to the fixed angle can be observed in a diffractive microscopic manner by an X-ray film 12.
申请公布号 JPH04218754(A) 申请公布日期 1992.08.10
申请号 JP19900070210 申请日期 1990.03.19
申请人 NEC CORP;KOUENERUGII BUTSURIGAKU KENKIYUU SHIYOCHIYOU 发明人 KITANO TOMOHISA;ISHIKAWA TETSUYA
分类号 G01N23/20 主分类号 G01N23/20
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