A method of operating a high density plasma CVD reactor with combined inductive and capacitive coupling,申请号EP19950302801-传众专利搜索

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发明名称	A method of operating a high density plasma CVD reactor with combined inductive and capacitive coupling
摘要
申请公布号	EP0680072(B1)	申请公布日期	2003.10.08
申请号	EP19950302801	申请日期	1995.04.26
申请人	APPLIED MATERIALS, INC.	发明人	SAHIN, TURGUT;REDEKER, FRED C.;NOWAK, ROMUALD;LI, SHIJIAN;DYER, TIMOTHY;WITTY, DEREK R.
分类号	H05H1/46;C23C16/44;C23C16/50;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01J37/32	主分类号	H05H1/46
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