发明名称 |
Process and apparatus for depositing on a substrate a flux of coating material of prefered orientation |
摘要 |
Targeted application of deposition material on a substrate comprises feeding the deposition material through a filter (90) having several channel-like individual structures (60) onto the substrate (30). The deposition material is applied at an angle to the substrate surface, in which the angle remains constant during the process. An Independent claim is also included for a device for targeted application of deposition material on a substrate comprising a filter positioned between a source of the deposition material and the substrate, and units for applying the deposition material at a constant angle to the substrate surface. Preferred Features: The individual structures of the filter have a square, rectangular or circular cross-section. |
申请公布号 |
EP1350863(A1) |
申请公布日期 |
2003.10.08 |
申请号 |
EP20020006164 |
申请日期 |
2002.03.19 |
申请人 |
SCHEUTEN GLASGROEP |
发明人 |
KAAS, PATRICK;GEYER, VOLKER |
分类号 |
C23C14/34;C23C14/04;C23C14/22;C23C14/35;C23C14/56;H01L21/285 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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