THINNER COMPOSITION FOR REMOVING PHOTOSENSITIVE RESIN

摘要

PURPOSE: A thinner composition for removing a photosensitive resin is provided, to remove the photosensitive solution on the edge and rear side of a substrate in the preparation of a semiconductor device and a liquid crystal display device. CONSTITUTION: The thinner composition comprises 1-80 parts by weight of propylene glycol monoalkyl ether acetate; 1-99 parts by weight of cycloketone; 0.001-1 parts by weight of polyethylene oxide-based condensate; and 0.001-1 parts by weight of a fluorinated acrylic copolymer. Preferably the propylene glycol monoalkyl ether acetate is selected from the group consisting of propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate and propylene glycol monobutyl ether acetate; the cycloketone is selected from the group consisting of cyclopentanone, cyclohexanone and cycloheptanone; and the polyethylene oxide-based condensate is a condensate of an alkylphenol and polyethylene oxide.