| 摘要 |
A scanning type exposure apparatus includes a substrate stage for holding a substrate and for moving the substrate in at least one of a scanning direction and a rotational direction, an original stage for holding an original and for moving the original in at least one of the scanning direction and the rotational direction, an optical system for transferring a pattern of the original onto the substrate, and a controller for controlling movements of the substrate stage and the original stage. The controller synchronously controls the substrate stage and the original stage in the scanning direction, and independently controls the substrate stage and the original stage in the rotational direction.
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