发明名称 JIG FOR POLISHING WAFER AND METHOD FOR MANUFACTURING THE SAME, AND APPARATUS FOR POLISHING WAFER USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a ceramic jig for polishing wafers used in polishing a plate shape body, such as semiconductor wafers, which is able to improve flatness and parallelism of the wafers without being corroded even in alkaline chemicals and ultrasonic waves used in a cleaning process of the jig for polishing the wafer. <P>SOLUTION: A ceramic guide member is jointed to an outer periphery of a ceramic stick plate having a wafer sticking surface so as to give the projecting height corresponding to the final finishing thickness of the wafer. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003285263(A) 申请公布日期 2003.10.07
申请号 JP20020091212 申请日期 2002.03.28
申请人 KYOCERA CORP;SHIN ETSU HANDOTAI CO LTD;NAGANO DENSHI KOGYO KK 发明人 IGARASHI HIROBUMI;KOBAYASHI DAISUKE
分类号 B24B37/04;B24B37/07;B24B37/30;H01L21/304 主分类号 B24B37/04
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