发明名称 |
JIG FOR POLISHING WAFER AND METHOD FOR MANUFACTURING THE SAME, AND APPARATUS FOR POLISHING WAFER USING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a ceramic jig for polishing wafers used in polishing a plate shape body, such as semiconductor wafers, which is able to improve flatness and parallelism of the wafers without being corroded even in alkaline chemicals and ultrasonic waves used in a cleaning process of the jig for polishing the wafer. <P>SOLUTION: A ceramic guide member is jointed to an outer periphery of a ceramic stick plate having a wafer sticking surface so as to give the projecting height corresponding to the final finishing thickness of the wafer. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2003285263(A) |
申请公布日期 |
2003.10.07 |
申请号 |
JP20020091212 |
申请日期 |
2002.03.28 |
申请人 |
KYOCERA CORP;SHIN ETSU HANDOTAI CO LTD;NAGANO DENSHI KOGYO KK |
发明人 |
IGARASHI HIROBUMI;KOBAYASHI DAISUKE |
分类号 |
B24B37/04;B24B37/07;B24B37/30;H01L21/304 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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